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GF80 / GF81 Series Metal Sealed Thermal Mass Flow Controllers & Meters

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GF80 / GF81 Series Metal Sealed Thermal Mass Flow Controllers & Meters

Flow Range (FS Capacity) : GF80 : 3 sccm – 50 slm ;

                                             GF81 : 51-300 slm

Accuracy : GF80 : ±1% S.P. 35-100% , ±0.35% F.S. 2-35% ;

                 GF81 : ±1% S.P. 35-100% , ±0.35% F.S. 5-35%

Repeatability : GF80 : <±0.20% S.P. ;

                        GF81 : 0.15% S.P.

Analog Communication : 0-5 V, 0-10 V, 0-20 mA, 4-20 mA
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Introduction

For many industrial and semiconductor processes, both performance and cost efficiency are crucial. The GF80 Series metal sealed mass flow controllers and meters deliver both: Engineered using the same fast response sensor and patented 4th generation MultiFlo™ technology as our best-selling GF100 series, it’s the right choice for operations that need high performance at a value price point. Moving to a metal sealed MFC brings the full benefit of MultiFloTM multi-gas/multi-range capability since there are no limitations in gases that can be used, enhanced purity of the gas due to elimination of oxygen permeation through elastomers, and a reduction in maintenance since metal seals will last indefinitely.

 

Features

* Long-term zero stability of <±0.5% full scale per year

* <1 second settling times

* Full-scale flow rates up to 300 slpm

* All-metal seal flow path - 16µ inch Ra surface finish

* Corrosion-resistant Hastelloy® sensor can operate at lower temperatures for gases prone to thermal decomposition

* Programmable MultiFloTM capability—one device, thousands of gas types and range combinations without removing the MFC from the gas line or compromising accuracy

* Best-in-class temperature coefficient specification through active temperature compensation

* Embedded self-test routines and independent diagnostic/service port

* Slimline body with VCR fittings

* DeviceNetTM, Profibus®, RS-485 and analog interfaces

 

Benefits

* Fast <1 second flow settling time eliminates wasted gas and process variability

* No elastomer seals that can have oxygen permeation, requiring replacement over time

* MultiFloTM simplifies and streamlines changing process gases — no more removing and calibrating MFCs

* New gases and/or ranges can be set in under 60 seconds

* Measurement accuracy not affected by temperature variations

* Convenient access to diagnostics port for maximum uptime

* Compact size eases integration into tight machine spaces; excellent choice for retrofits

* Multi-protocol communication interface simplifies integration into existing systems

 

Applications

* Cost efficient retrofit/upgrade of legacy MFCs in refurbished semiconductor process tools

* Reduce MFC inventory in six-inch/eight-inch semiconductor fabs

* MOCVD for LED and power device manufacturing

* Solar/thin film chemical vapor deposition (CVD) systems

* Analytical OEM equipment